A Fashion Design programme at Chandigarh University, Unnao Campus is a multidisciplinary, industry-aligned programme that focuses on Design Innovation, hands-on training and industry requirements with global visionary skills.
A programme that stays current and relevant with a future ready, industry-oriented, personalized curriculum. Driven by robust research, interdisciplinary approach and human centered design, while focusing on innovation, craftsmanship and entrepreneurship to shape the future designers for the global world.
Our programme is thoughtfully curated in a way that fosters ethical designing and environmental consciousness among students by nurturing their creative minds and making them aesthetically sensible and creative. The programme provides students in-depth options to learn about eco-friendly fabrics, ethical sourcing, waste reduction methods, and upcycling techniques introducing sustainability as a mindset not just a module.
The endorsement from the Bar Council of India grants validity to globally recognized programs, positioning CU amongst the best and top law colleges in India.
1Progressive curriculum will develop interdisciplinary approach and critical thinking amongst students.
2Experienced and globally acclaimed faculty members will shape a student's career.
3An engaging experiential learning environment is fostered through moot courts, trial advocacy, client counseling, legal aid camps, court visits, and workshops.
4A Technology driven and AI integrated curriculum will shape future ready legal professionals, ideal for those searching for opportunities with real-world exposure.
5Global exposure through international exchange program offers global perspective to students by global experts in the field of law.
6Specialization opportunities from array of courses will open the legal career pathways in the field of Artificial Intelligence.
7Internship opportunities from first year onwards with top law firms, corporate legal departments, and government agencies, backed by the dedicated placement cell, making Chandigarh University, Uttar Pradesh, one of the best law institutions for career progression.
8The campus provides students with the latest facilities and various softwares and tools like Tukatech, Adobe Photoshop, Adobe Illustrator, Corel Draw, CLO 3D Wi-Fi, and digital library and a smart classroom with well equipped Audio-Video teaching for imparting learning.
Industrial machines like Single needle Juki Sewing machine, along with textile testing equipment required to analyses the properties of textiles and their applicability in developing different products
The students will have:
The students undergo two internships, the aim of which is to provide students with hands-on experience of real-world scenarios and problems.
Yes. There is an option to opt for a research project / capstone project wherein a student selects a topic of his choice or as suggested by his/her respective faculty and develops a research design to answer pertinent questions related to the topic after a thorough research process of collecting and analyzing data.
Of course, yes. The program is designed in a way that touches upon the foundational level requirements of humanities and social sciences while building on to a nuanced level of teaching as the semester progresses.
Two internships offered to all students to give them robust experiences of industry requirements, also to honing their employability skills.
Yes, there are a number of MoUs that will open up pathways for global exposure, including international exchange programs.
Yes, curated sessions are organized for interested candidates throughout their academic journey at CU Unnao campus.
Yes, the CU, Unnao campus has a well-equipped amenities for both male and female and cleanliness is our top priority. The allotment is done on a first-come, first-served basis.
Join our world-class programs designed to inspire innovation and foster excellence. With a focus on holistic development, we equip you with the skills to excel in your chosen field and lead the way in a dynamic world.
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